Asterion offers a wide range of economical and efficient electroless nickel processes. From traditional lead and cadmium containing deposits to the modern ROHS compliant systems without lead or cadmium, Asterion has a full range of EN processes. In addition, Asterion offers systems that enhance lubricity and hardness. All of the Asterion electroless nickel processes are formulated to be used with liquid nickel sulfate at either 100 g/l or 133 g/l.
Traditional lead and cadmium containing electroless nickel systems are available in low phosphorous (1% to 3%), mid phosphorous (7% to 9%) and high phosphorous (10.5% to 12%).
A PTFE additive is available to be used with both the mid and high phosphorous systems to impart very low friction values
Traditional Non ROHS EN
These systems are based upon liquid nickel sulfate containing 100 g/l or 133 g/l nickel. They are not ROHS compliant with a deposit containing both lead and cadmium
Low Phosphorous
Asterion offers a traditional work horse, low phosphorous EN system. The low phosphorous deposit is uniform, bright and high speed. The fast plating rate is combined with controlled hardness. The deposit exhibits characteristics of excellent brightness with low porosity. In addition, the low phosphorous deposit exhibits natural porosity and is self polishing. On ferrous or copper alloy substrates, users report a bath life of 8 to 10 turns. Aluminum alloys provide between 5 to 7 turns. The deposit is heat treatable to over 900 VHN. Iit is an excellent choice for engineering applications.
High Phosphorous
Asterion offers a traditional high phosphorous electroless nickel system. The high phosphorous deposit (10.5% to 12%) is uniform, semi-bright and highly protective. The deposit is uniform with no edge hardness. It provides a solderable hard coating. The deposit exhibits characteristics of excellent brightness with low porosity. In addition, the high phosphorous deposit exhibits natural lubricity and is self polishing. It is heat treatable to 68 Rockwell C for improved hardness or adhesion. On ferrous or copper alloy substrates, users report a bath life of 8 to 10 turns. Aluminum alloys provide between 5 to 7 turns.
Mid Phosphorous
Asterion offers a traditional mid phosphorous electroless nickel system. The mid phosphorous deposit (7% to 9%) is uniform, bright and high speed. The fast plating rate is combined with controlled hardness. The deposit exhibits characteristics of excellent brightness with low porosity. In addition, the low phosphorous deposit exhibits natural porosity and is self polishing. On ferrous or copper alloy substrates, users report a bath life of 8 to 10 turns. Aluminum alloys provide between 5 to 7 turns. Self regulating pH and non self regulating pH systems are available. Ductile deposits accept post plate heat treatment for additional deposit hardness or improved adhesion.
Other Non ROHS
PTFE Mid Phosphorous Deposit (Non ROHS)
Asterion offers a mid phosphorous electroless nickel system which contains a PTFE additive. The deposit is not ROHS compliant and contains lead and cadmium. The mid phosphorous deposit (7% to 9%) is uniform, bright and high speed. The fast plating rate is combined with controlled hardness. The deposit exhibits characteristics of excellent brightness with low porosity. The PTFE material is occluded into the deposit and provides very low friction values. It can be applied to a wide variety of metals with excellent release and anti stick characteristics. The stable bath offers excellent stability with a consistent deposition rate.
Low Phosphorous Boron Nitrite (Non ROHS)
Asterion offers a low phosphorous EN system containing boron nitrite particles occluded in the low phosphorous deposit. The deposit is not ROHS compliant with a deposit containing both lead and cadmium. The low phosphorous deposit contains a uniform distribution of boron nitrite of approximately 6% to 8% by weight of boron nitrite. The plating rate is 0.6 mils per hour. The deposit may be heat treated to 850VHN. The deposit exhibits characteristics of a very low coefficient of friction without the loss of hardness found in deposits containing PTFE.
Hard As Plated EN Deposit (Non ROHS)
Asterion offers a hard as plated electroless nickel process offering an as plated hardness of 63 Rockwell. The system is based upon the use of highly purified source of liquid nickel sulfate. The mirror bright finish contains 3% to 6% phosphorous and plates at a rate 0.9 mils per hour. The deposit will meet ASTM B733 and AMS 2404B specifications. This process is ideal for critical wear applications when heat treatment is not possible or practical. The coating is similar to more expensive EN-Boron deposits and supereior to other Ni-P coatings. The compressively stressed deposit is produced from a bath which has an expected life of 6 metal turnovers.
ROHS Compliant
Mid Phosphorous Electroless Nickel (ROHS Compliant
Asterion offers a mid phosphorous EN system which is fully ROHS compliant with a deposit free of lead or cadmium. The low phosphorous deposit is uniform, bright and high speed. The fast plating rate is combined with controlled hardness. The deposit exhibits characteristics of excellent brightness with low porosity. In addition, the low phosphorous deposit exhibits natural porosity and is self polishing. On ferrous or copper alloy substrates, users report a bath life of 8 to 10 turns. Phosphorous content of the plated deposit ranges from 6% to 9%. Aluminum alloys provide between 5 to 7 turns. The system offers excellent stability.
High Phosphorous Electroless Nickel ROHS Compliant
Asterion offers a ROHS Compliant high phosphorous electroless nickel system. The deposit is fully ROHS compliant and contains no lead or cadmium. The high phosphorous deposit (in excess of 9.75%) is uniform, semi-bright and highly protective. The deposit is uniform with no edge hardness. It provides a solderable hard coating. The deposit exhibits characteristics of excellent brightness with low porosity. In addition, the high phosphorous deposit exhibits natural lubricity and is self polishing.
It is heat treatable to 68 Rockwell C. The bath exhibits excellent performance in even extremely low loading conditions of less than 0.25 square feet per gallon. On ferrous or copper alloy substrates, users report a bath life of 8 to 10 turns. Aluminum alloys provide between 5 to 7 turns.
Alkaline Electroless Nickel
Alkaline Electroless Nickel
Asterion offers an Alkaline Electroless Nickel Strike which provides a superior base plate for zincated aluminum substrates or ferrous metal castings and forgings. The deposit provides a continuous seal for superior adhesion of subsequent operations. The Alkaline Strike is compatible with all electroless nickel processes. Additionally, the Alkaline Strike extends the life of subsequent electroless nickel baths by reducing metallic contaminates that slow the deposit rate
Alkaline Electroless Nickel Plating Process
Asterion offers an excellent alkaline based electroless nickel plating process. The alkaline process works exceptionally well in plating on plastics applications. Excellent stability with long bath life makes this an economical choice. The alkaline electroless nickel plating process produces a very uniform, semi bright and ductile deposit.